hkmg process flow
由CQin著作·2013·被引用1次—Inthispaper,aprocesschallengeofintegratingDualStressLiner.(DSL)(1)-(2)intogate-lastHigh-k/MetalGate(HKMG)flowis.,ProcessflowofNSFETconsideringHKMGwithgate-lastprocess.(a)and(b)AfterfinformationbasedonSi/SiGestack,(c)-(e)...
CN104517902A
- Semiconductor gate
- high k metal gate製程
- metal gate半導體
- high k metal gate process flow
- metal gate中文
- metal gate process flow
- gate first gate last ppt
- metal gate好處
- hkmg process flow
- Why metal gate
- metal gate poly gate
- high k metal gate原理
- high k metal gate製程
- metal gate製程
- metal work function table
- 改善短通道效應
- rc delay半導體
- metal gate h1z1
- hk metal gate
- 半導體poly gate
- 28nm process flow
- stage gate process
- metal gate半導體
- high k metal gate process
- metal gate好處
本发明涉及简化的先栅极HKMG制造流程,当依据先栅极HKMG方法形成场效应晶体管时,在硅化步骤以前必须移除形成于栅极电极的顶部上的覆盖层,从而导致在晶体管的栅极电极 ...
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